Sang Hee Jung

Title: Innovations of Sang Hee Jung in Pattern Formation

Introduction

Sang Hee Jung is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of pattern formation through his innovative methods. With one patent to his name, he has demonstrated a keen ability to develop advanced techniques that enhance manufacturing processes.

Latest Patents

Sang Hee Jung's patent, titled "Method of forming patterns using reverse patterns," outlines a sophisticated approach to creating patterns. In this method, first and second upper reverse patterns are formed on a lower reverse layer. A buffer layer is then created to fill the first opening portions provided by the first upper reverse pattern. Following this, a shield pattern is established to cover a second region of the buffer layer. An etching process is performed using the shield pattern and the first upper reverse pattern as an etching mask to form first lower reverse patterns that provide second openings overlapping the first openings, a buffer layer pattern, and a second lower reverse pattern overlapping the shield pattern. Finally, a hard mask layer is formed and etched to separate hard mask layer first patterns filling the first and second openings, followed by another etching process using the hard mask layer first patterns and the second upper reverse patterns as etching masks to form third lower reverse patterns overlapping the second upper reverse pattern.

Career Highlights

Sang Hee Jung is currently employed at SK Hynix Inc., a leading semiconductor manufacturer. His work at the company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology and manufacturing.

Collaborations

Sang Hee Jung collaborates with talented individuals such as Jung Hyung Lee and Sarohan Park, who contribute to the innovative environment at SK Hynix Inc. Their teamwork fosters creativity and drives the development of new technologies.

Conclusion

Sang Hee Jung's contributions to the field of pattern formation exemplify the impact of innovation in technology. His patent showcases a unique method that enhances manufacturing processes, reflecting his expertise and dedication to advancing the industry.