Pyeongtaek, South Korea

Sang Eun Lee

This inventor holds 1 USPTO granted patent. Top assignee: G-Smatt Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang Eun Lee. Retrieved from https://idiyas.com/inventor/sang-eun-lee-07rrndsq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovator Sang Eun Lee and Her Contributions to Pattern Safety Devices

Introduction

Sang Eun Lee is a notable inventor based in Pyeongtaek-si, South Korea. She has made significant contributions to the field of pattern safety devices, particularly in preventing interference between patterns on substrates. Her innovative approach has the potential to enhance the reliability of electronic components.

Latest Patents

Sang Eun Lee holds a patent for a "Pattern safety device for preventing interference between patterns." This invention discloses a method for defining a separately partitioned space in an adhesion portion formed on multiple patterns on a substrate. This design allows for the placement of circuit elements on the adhesion portion, effectively preventing interference between the patterns. She has 1 patent to her name.

Career Highlights

Sang Eun Lee is currently employed at G-smatt Co., Ltd., where she continues to develop innovative solutions in her field. Her work at the company has positioned her as a key player in advancing technology related to pattern safety devices.

Collaborations

Some of her coworkers include Ho Joon Lee and Hak Ryul Shin, who contribute to the collaborative environment at G-smatt Co., Ltd. Their teamwork fosters innovation and drives the development of cutting-edge technologies.

Conclusion

Sang Eun Lee's contributions to the field of pattern safety devices exemplify her dedication to innovation and technology. Her patent reflects her commitment to enhancing the functionality and reliability of electronic components.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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