Sang Duk Park

Title: Innovations of Sang Duk Park

Introduction

Sang Duk Park is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing device performance and fabrication methods in semiconductor devices.

Latest Patents

One of his latest patents is titled "Semiconductor device and method of fabricating the same." This invention includes a semiconductor device with first and second source/drain patterns on an active pattern, which are spaced apart from each other. It features a first source/drain contact that includes a barrier film and a filling film, along with a gate structure positioned between the source/drain contacts. The design ensures that the top surface of the first source/drain contact is lower than that of the gate structure, optimizing the device's performance.

Another significant patent is "Semiconductor device and fabricating method thereof." This invention aims to enhance device performance by variably adjusting the threshold voltage of a transistor with a gate-all-around structure. The device comprises a substrate with distinct regions, wire patterns, gate insulating films, and gate electrodes, all designed to improve the overall functionality of the semiconductor device.

Career Highlights

Sang Duk Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge innovations in semiconductor technology.

Collaborations

He has collaborated with notable coworkers, including Bo Soon Kim and Hyun Ji Kim, who have also contributed to advancements in the field.

Conclusion

Sang Duk Park's innovative work in semiconductor technology showcases his expertise and commitment to enhancing device performance. His patents reflect significant advancements that contribute to the ongoing evolution of the semiconductor industry.