Seoul, South Korea

Sang Bum Jeon

This inventor holds 1 USPTO granted patent. Top assignee: Moltex Co., Ltd.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang Bum Jeon. Retrieved from https://idiyas.com/inventor/sang-bum-jeon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Innovations of Sang Bum Jeon in UV-Curable Transfer Ink

Introduction

Sang Bum Jeon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of printing technology, particularly with his innovative approach to UV-curable transfer inks. His work has implications for various industries, including packaging and graphic design.

Latest Patents

Sang Bum Jeon holds a patent for a UV-curable transfer ink. This innovative ink can be cured by UV light and is designed to emboss precise and clear patterns on substrates. The formulation includes 20-40% by weight of a UV-reactive ink, 20-40% by weight of an acrylic copolymer, 4-6% by weight of an ethylene vinyl acetate copolymer, 25-35% by weight of an organic solvent, and 0.5-5% by weight of a bulking agent. The process involves printing the transfer ink in a predetermined pattern on a printing sheet, applying it to a substrate, exposing it to UV light to cure the ink, and then etching the substrate to reveal the embossed pattern.

Career Highlights

Sang Bum Jeon is currently associated with Moltex Co., Ltd., where he continues to develop innovative solutions in the field of printing technology. His expertise in UV-curable inks has positioned him as a key player in advancing printing methods that enhance quality and efficiency.

Conclusion

Sang Bum Jeon's contributions to the field of UV-curable transfer inks demonstrate his innovative spirit and commitment to advancing printing technology. His patent reflects a significant step forward in creating high-quality embossed patterns, showcasing the potential for further developments in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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