Heverlee, Belgium

Sandip Halder

This inventor holds 1 USPTO granted patent. Top assignee: Basf Se Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sandip Halder. Retrieved from https://idiyas.com/inventor/sandip-halder-j7sxnlai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Sandip Halder: Innovator in Superconducting Technology

Introduction

Sandip Halder is a notable inventor based in Haverlee, Belgium. He has made significant contributions to the field of superconducting technology, particularly through his innovative patent.

Latest Patents

Halder holds a patent for a substrate for a superconducting thin-film strip conductor. This high-temperature superconducting thin-film strip conductor (HTSL-CC) includes a metal substrate, a buffer layer chemically generated thereon, and a chemically generated superconducting coating. The HTSL-CC is characterized by high texturing of the buffer layer, as the metal substrate has a surface roughness of RMS < 50 nm. The buffer layer is grown directly onto the surface of the metal substrate without an intermediate layer, maintaining a crystallographically unrotated relationship with the crystalline structure of the substrate. He has 1 patent to his name.

Career Highlights

Sandip Halder is currently employed at BASF SE Corporation, where he continues to work on advancements in superconducting materials. His expertise in this area has positioned him as a key player in the development of innovative technologies.

Collaborations

Halder collaborates with esteemed colleagues, including Michael Baecker and Theodor Schneller, who contribute to his research and development efforts.

Conclusion

Sandip Halder's work in superconducting technology exemplifies innovation and dedication to advancing materials science. His contributions are paving the way for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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