Bengaluru, India

Sandesh Yadamane Dharmaiah

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sandesh Yadamane Dharmaiah. Retrieved from https://idiyas.com/inventor/sandesh-yadamane-dharmaiah

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sandesh Yadamane Dharmaiah - Innovator in Semiconductor Manufacturing

Introduction

Sandesh Yadamane Dharmaiah is an inventor based in Bengaluru, India. He has made significant contributions to the field of semiconductor manufacturing. His innovative ideas focus on enhancing gas distribution assemblies for processing chambers.

Latest Patent Applications

Sandesh Yadamane Dharmaiah has filed a patent application titled "HEATED METAL LID FOR SELECTIVE PECVD." This application describes gas distribution assemblies for a semiconductor manufacturing processing chamber. The assembly comprises a first showerhead with a first flange and a second showerhead with a second flange. A first two-piece RF isolator is included, which consists of a first inner RF isolator spaced from a first outer RF isolator. The first inner RF isolator is positioned from the first flange of the first showerhead to create a first flow path. Additionally, a second two-piece RF isolator is described, which comprises a second inner RF isolator spaced from a second outer RF isolator. The second RF isolator is positioned from the second flange of the second showerhead to create a second flow path. The application also details processing chambers that incorporate these gas distribution assemblies, along with processing methods that utilize them.

Conclusion

Sandesh Yadamane Dharmaiah is an innovative inventor whose work in semiconductor manufacturing showcases his commitment to advancing technology. His patent application reflects his expertise and potential impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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