Fremont, CA, United States of America

Samuel Hein

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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3 patents (USPTO):Explore Patents

Title: Samuel Hein: Innovator in Dielectric Materials and Capacitor Technology

Introduction: Samuel Hein, an accomplished inventor based in Fremont, CA, has made significant contributions to the field of capacitor technology. With a total of three patents to his name, Hein is dedicated to advancing the use of dielectric materials in electronic applications.

Latest Patents: Hein's latest patents include groundbreaking work on Yanli dielectric materials and capacitors. His invention features a composite polymeric material that integrates multiple repeating backbone units and polarizable units, designed to create a metadielectric. This innovative material is essential for forming metacapacitors that enhance the performance of electronic devices. Another notable patent is the electro-polarizable compound, which presents a unique framework employing a self-assembling electro-conductive oligomer. This compound's design allows for manipulating polarization through its distinct molecular structure, aiming to improve the efficiency of electronic components.

Career Highlights: Samuel Hein works at Capacitor Sciences Incorporated, where his innovative ideas are transforming the realm of capacitor technology. His role and ongoing research have positioned him as a key player in the development of advanced dielectric materials.

Collaborations: Hein collaborates with experts in the field, including his coworkers Pavel Ivan Lazarev and Yan Li. Their combined expertise and innovative approaches contribute to the ongoing advancement of capacitor technology and the development of novel materials.

Conclusion: Samuel Hein's contributions to the field of dielectric materials and capacitors underscore his status as an influential inventor. With a strong focus on innovation, his work continues to pave the way for future advancements in electronic applications.

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