Samuel F Louke

Title: Innovations by Samuel F. Louke

Introduction

Samuel F. Louke is a notable inventor based in Beaverton, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of chemical-mechanical polishing. With a total of 2 patents, Louke's work has advanced the methods used in the semiconductor manufacturing process.

Latest Patents

Louke's latest patents include the "Orbital motion chemical-mechanical polishing method and apparatus." This invention describes a method and apparatus for polishing a thin film formed on a semiconductor substrate. The process involves orbiting a table covered with a polishing pad about an axis. Slurry is fed through a plurality of spaced-apart holes formed through the polishing pad to uniformly distribute the slurry across the pad surface during polishing. A substrate is pressed face down against the orbiting pad's surface and rotated to facilitate the polishing of the thin film formed on the substrate.

Career Highlights

Samuel F. Louke is currently employed at Intel Corporation, where he continues to innovate and develop new technologies. His work at Intel has positioned him as a key player in the semiconductor industry, contributing to advancements that enhance manufacturing efficiency and product quality.

Collaborations

Louke has collaborated with notable colleagues such as Joseph R. Breivogel and Michael R. Oliver. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Samuel F. Louke's contributions to the field of semiconductor technology through his patents and work at Intel Corporation highlight his role as an influential inventor. His innovative methods in chemical-mechanical polishing continue to impact the industry positively.