Samuel Ciocys

Title: Innovations of Samuel Ciocys in Ultrafast Electric Gating

Introduction

Samuel Ciocys is an innovative inventor based in Berkeley, CA. He has made significant contributions to the field of ultrafast electric gating technology. His work focuses on utilizing light to control electronic properties in two-dimensional materials.

Latest Patents

Samuel Ciocys holds a patent for a groundbreaking invention titled "Light-driven ultrafast electric gating." This patent describes a device where a source and drain electrode are separated by an optically exposed gate region above a surface photovoltage effect (SPV) bulk. The device incorporates a two-dimensional material deposited on the gate region, which is activated by exposure to an ultrafast light pulse. This pulse can be infrared or near-infrared and may consist of a focused collimated laser pulse with a sub-picosecond width. The activation of the gate region leads to electron-hole pair generation, resulting in band bending in the SPV material. This process generates an electric field within the 2D material, modifying the electronic properties between the source and drain via a field-effect. The conduction continues until the conductive electron-hole pairs recombine during the SPV decay time. The two-dimensional material may consist of a crystalline atomic monolayer, and the activation is repeatable with subsequent pulses, allowing the device to cycle on and off within timescales of less than 200 picoseconds. He has 1 patent to his name.

Career Highlights

Samuel Ciocys is affiliated with the University of California, where he conducts his research and development. His work has positioned him as a notable figure in the field of ultrafast electronics.

Collaborations

One of his prominent collaborators is Alessandra Lanzara, with whom he has worked on various projects related to his patent.

Conclusion

Samuel Ciocys is a pioneering inventor whose work in light-driven ultrafast electric gating is shaping the future of electronic devices. His innovative approach and collaboration with esteemed colleagues continue to push the boundaries of technology.