Urbana, IL, United States of America

Samit Basu

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: University of Illinois. Active years: 2001-2002.


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 39(Granted Patents)


Location History:

  • Clifton Park, NY (US) (2001)
  • Urbana, IL (US) (2001 - 2002)

Company Filing History:


Years Active: 2001-2002

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4 patents (USPTO):Explore Patents

Title: Samit Basu: Innovator in Tomography Algorithms

Introduction

Samit Basu is a prominent inventor based in Urbana, IL (US). He has made significant contributions to the field of tomography through his innovative algorithms. With a total of 4 patents, Basu's work focuses on enhancing the efficiency and accuracy of 3D imaging techniques.

Latest Patents

One of his latest patents is titled "Fast hierarchical reprojection algorithm for tomography." This invention presents a method for reprojecting a 3D image into a 3D Radon sinogram. The process involves dividing a three-dimensional image into sub-images as small as one voxel. These sub-images are then reprojected at a smaller number of orientations to create subsinograms. The method employs two algorithms for aggregating the sub-sinograms. The first algorithm provides exact aggregation, while the second offers an approximation through interpolation. By alternating between these algorithms, Basu achieves a balance of speed and accuracy in the results.

Career Highlights

Samit Basu is affiliated with the University of Illinois, where he continues to advance research in imaging technologies. His work has garnered attention for its practical applications in medical imaging and other fields.

Collaborations

Basu collaborates with Yoram Bresler, a fellow researcher, to further explore advancements in tomography and imaging algorithms.

Conclusion

Samit Basu's innovative contributions to tomography algorithms demonstrate his commitment to improving imaging techniques. His work not only enhances accuracy but also increases efficiency in the field.

Profile summary based on public USPTO records.
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