Location History:
- Menlo Park, CA (US) (2002)
- Mountain View, CA (US) (2001 - 2003)
- San Francisco, CA (US) (2004)
Company Filing History:
Years Active: 2001-2004
Title: Innovations by Sameer Desai
Introduction
Sameer Desai is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving processes and materials used in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Apparatus for improving barrier layer adhesion to HDP-FSG thin films." This invention describes a method for forming a damascene FSG film with enhanced adhesion to silicon nitride in an HDP-CVD system. The process utilizes silane (SiH), silicon tetrafluoride (SiF), oxygen (O), and argon (Ar) as reactant gases. The combination of these gases facilitates the deposition of the FSG film while mitigating destructive effects during the process.
Another significant patent by Desai is the "Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating." This invention addresses the challenge of filling narrow gaps on a semiconductor substrate without voids. By employing differential heating characteristics in a high-density plasma chemical vapor deposition system, the method ensures that gaps are filled effectively, enhancing the overall quality of semiconductor devices.
Career Highlights
Sameer Desai is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to cutting-edge technologies that drive advancements in semiconductor manufacturing.
Collaborations
Desai has collaborated with several talented individuals in his field, including Pravin K Narwankar and Walter Zygmunt. These collaborations have further enriched his work and contributed to the success of his inventions.
Conclusion
Sameer Desai's innovative contributions to semiconductor technology demonstrate his expertise and commitment to advancing the industry. His patents reflect a deep understanding of the challenges in semiconductor manufacturing and offer practical solutions to enhance performance and efficiency.