This inventor holds 1 USPTO granted patent. Top assignee: Ge Infrastructure Technology, LLC. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Sam Van Orman: Innovator in Material Accretion Detection
Introduction
Sam Van Orman is a notable inventor based in Atlanta, GA (US). He has made significant contributions to the field of technology, particularly in the area of material accretion detection and removal. His innovative approach has led to the development of a unique patent that addresses critical monitoring needs.
Latest Patents
Sam Van Orman holds a patent for "Systems and methods for material accretion detection and removal." This patent describes a system designed to monitor at least one component. The system includes at least one processor in communication with at least one memory device. The processor is programmed to store a plurality of baseline information associated with the monitored component and to receive a plurality of current images of that component. It is also programmed to detect deviations from the baseline by comparing current images with baseline information. Furthermore, the processor classifies the deviation and implements corrective actions based on the classification. This innovative system enhances the reliability and efficiency of monitoring processes.
Career Highlights
Sam Van Orman is currently employed at GE Infrastructure Technology, LLC. His work at this company has allowed him to apply his inventive skills in a practical setting, contributing to advancements in technology and engineering.
Collaborations
Some of Sam's coworkers include John Karigiannis and Arpit Jain. Their collaboration fosters a creative environment that encourages innovation and the development of new technologies.
Conclusion
Sam Van Orman is a distinguished inventor whose work in material accretion detection has made a significant impact in the field. His patent reflects his commitment to advancing technology and improving monitoring systems.