Portland, OR, United States of America

Sam F Louke


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 164(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Sam F Louke: Innovator in Semiconductor Polishing Technology

Introduction

Sam F Louke is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of semiconductor processing, particularly through his innovative designs in polishing technology. With a focus on enhancing the efficiency and effectiveness of semiconductor manufacturing, Louke has secured a patent that showcases his expertise.

Latest Patents

Louke holds a patent for a "Composite polishing pad for semiconductor process." This innovative polishing pad features a unique design that includes a first layer of elastic material, a second stiff layer, and a third layer optimized for slurry transport. The third layer is the one that comes into contact with the wafer during the polishing process. The second layer is segmented into individual sections that are physically isolated from one another in the lateral dimension. Each section is resilient across its width and cushioned by the first layer in the vertical direction. This design creates a 'bedspring' effect, allowing the pad to conform to longitudinal gradations across the wafer, thereby improving the polishing process.

Career Highlights

Sam F Louke is currently employed at Intel Corporation, a leading company in the technology sector. His work at Intel has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology. His patent reflects his commitment to improving manufacturing processes and enhancing product quality.

Collaborations

Louke has collaborated with notable colleagues, including Joseph R Breivogel and Michael R Oliver. These partnerships have likely fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Sam F Louke's contributions to semiconductor polishing technology exemplify the impact of innovation in manufacturing processes. His patented designs not only enhance efficiency but also demonstrate the importance of collaboration in driving technological advancements.

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