Sam Antley

Title: The Innovative Contributions of Sam Antley

Introduction

Sam Antley is a notable inventor based in Cottonwood, AZ (US). He has made significant contributions to the field of plasma technology, particularly through his innovative patent. His work is recognized for its potential applications in various industries, showcasing the importance of advancements in plasma processing.

Latest Patents

Sam Antley holds a patent for an "Inductively Coupled High-Density Plasma Source." This invention includes an annular insulating body with an annular cavity formed within. An inductor coil serves as an antenna, generating a first magnetic field within a plasma duct's interior region. The design allows for efficient inductive coupling to the plasma when the annular body surrounds a portion of the plasma duct. The invention also features a grounded conductive housing and an electrostatic shield, enhancing its operational efficiency. The T-match network is in electrical communication with the inductor coil, facilitating the efficient transfer of RF power from a source to the plasma.

Career Highlights

Sam Antley is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to further develop his expertise in plasma technology and contribute to cutting-edge innovations.

Collaborations

Throughout his career, Sam has collaborated with notable colleagues, including Bill H. Quon and Jovan Jevtic. These collaborations have enriched his work and fostered a creative environment for innovation.

Conclusion

Sam Antley's contributions to the field of plasma technology through his patent demonstrate his commitment to innovation and advancement. His work at Tokyo Electron Limited and collaborations with esteemed colleagues further highlight his impact in the industry.