Cd. Juarez Chihuahua, Mexico

Salvador Guadalajara

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Hanon Systems. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Salvador Guadalajara. Retrieved from https://idiyas.com/inventor/salvador-guadalajara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Salvador Guadalajara - Innovator in Metal Seal Fitting Technology

Introduction: Salvador Guadalajara is an inventive mind based in Cd. Juarez, Chihuahua, Mexico. He currently works at Hanon Systems, where he contributes to the development of innovative technologies. Although he has not yet been granted any patents, his work in the field of engineering showcases his potential as an inventor.

Latest Patent Applications: Salvador Guadalajara has submitted a patent application for a technology titled "Metal Seal Fitting with Tight Bend Technology." This application describes a block fitting assembly that includes a first block with an opening, a sealing element, and a tube. The tube features a first segment that extends through the block's opening and a second segment arranged at an angle to the first. A bend portion connects these segments, and the end of the first segment forms a seal engaging surface for the sealing element. This innovative design aims to enhance the functionality and efficiency of fitting assemblies.

Conclusion: Salvador Guadalajara is an emerging inventor whose work in metal seal fitting technology holds promise for future innovations. His contributions at Hanon Systems reflect his dedication to advancing engineering solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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