Summit, NJ, United States of America

Salvador Duenas

This inventor holds 1 USPTO granted patent. Top assignee: Lucent Technologies Inc.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Salvador Duenas. Retrieved from https://idiyas.com/inventor/salvador-duenas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 69(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Salvador Duenas: Innovator in Thin Film Capacitors

Introduction

Salvador Duenas is a notable inventor based in Summit, NJ (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of thin film capacitors. His innovative work has led to the granting of a patent that showcases his expertise and creativity in this area.

Latest Patents

Duenas holds a patent for "Thin film capacitors and process for making them." This invention pertains to a thin film capacitor designed for use in semiconductor integrated circuit devices, including analog circuits, RF circuits, and dynamic random access memories (DRAMs). The capacitor features a dielectric thickness of less than about 50 nm, a capacitance density of at least about 15 fF/μm², and a breakdown field of at least about 1 MV/cm. The dielectric material utilized is a metal oxide, which can be titanium, niobium, or tantalum, and may also contain silicon or nitrogen. The fabrication process involves depositing the metal onto a substrate or a first electrode, followed by anodic oxidation to achieve the desired dielectric thickness. A top electrode is then formed over the dielectric layer, ensuring that it does not compromise the electrical characteristics of the capacitor.

Career Highlights

Duenas has been associated with Lucent Technologies Inc., where he has applied his skills and knowledge to advance semiconductor technologies. His work has not only contributed to the company's innovations but has also positioned him as a key player in the field of electronics.

Collaborations

Throughout his career, Duenas has collaborated with talented individuals such as Maureen Yee Lau and Henry Y Kumagai. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Salvador Duenas is a distinguished inventor whose work in thin film capacitors has made a significant impact on semiconductor technology. His patent reflects his innovative spirit and dedication to advancing the field. Duenas continues to be a valuable contributor to the world of electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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