Sakurako Natori

Title: Sakurako Natori: Innovator in Substrate Processing Technology

Introduction

Sakurako Natori is a prominent inventor based in Yamanashi, Japan. She has made significant contributions to the field of substrate processing technology, holding two patents that showcase her innovative approach. Her work is particularly relevant in industries that require precision in material processing.

Latest Patents

Natori's latest patents focus on pattern enhancement using a gas cluster ion beam. The first patent describes a method of processing a substrate that involves loading the substrate onto a substrate holder. The substrate features a major surface with a specific feature that has a first width along an etch direction. The method includes exposing portions of the major surface and changing the first width of the feature to a second width by etching a first portion of the sidewalls of the feature with a gas cluster ion beam oriented along a beam direction. This innovative technique allows for enhanced precision in substrate processing.

Career Highlights

Sakurako Natori is currently employed at Tel Manufacturing and Engineering of America, Inc. Her role at the company allows her to apply her expertise in substrate processing and contribute to advancements in manufacturing technology. Natori's work is characterized by her commitment to innovation and excellence in her field.

Collaborations

Natori has collaborated with notable coworkers, including Kazuya Dobashi and Hiromitsu Kambara. These collaborations have further enriched her work and contributed to the development of cutting-edge technologies in substrate processing.

Conclusion

Sakurako Natori is a trailblazer in the field of substrate processing technology. Her patents and career achievements reflect her dedication to innovation and her impact on the industry. Through her work, she continues to inspire future generations of inventors and engineers.