Kanagawa, Japan

Sakuo Koyata

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sakuo Koyata. Retrieved from https://idiyas.com/inventor/sakuo-koyata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Sakuo Koyata: Innovator in Substrate Cleaning Methods

Introduction

Sakuo Koyata is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of substrate cleaning, particularly through his innovative methods. His work is recognized for its practical applications in various industries.

Latest Patents

Koyata holds a patent for a method of cleaning substrates. This method involves cleaning the surface of a substrate using an acidic solution, oxidizing solution, or alkaline solution. A key aspect of this process is the removal of the natural oxide film that forms on the substrate's surface. This innovation enhances the efficiency and effectiveness of substrate cleaning.

Career Highlights

Sakuo Koyata is associated with Sony Corporation, a leading technology company known for its advancements in electronics and entertainment. His role at Sony has allowed him to work on cutting-edge technologies and contribute to the company's innovative projects.

Collaborations

Koyata has collaborated with talented individuals such as Koichiro Saga and Takeshi Hattori. These collaborations have fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

Sakuo Koyata's contributions to substrate cleaning methods exemplify his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the field, showcasing the importance of effective cleaning processes in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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