Kawasaki, Japan

Saki Shibuichi

This inventor holds 1 USPTO granted patent. Top assignee: Canon Anelva Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Saki Shibuichi. Retrieved from https://idiyas.com/inventor/saki-shibuichi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Saki Shibuichi: Innovator in Magnetoresistance Technology

Introduction

Saki Shibuichi is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of magnetoresistance technology, showcasing her expertise through her innovative patents.

Latest Patents

Saki Shibuichi holds a patent for a magnetoresistance effect element. This invention includes a barrier layer, a reference layer formed on one surface of the barrier layer, a free layer formed on the other surface of the barrier layer, and a pinned layer placed on the opposite side of the reference layer from the barrier layer. The pinned layer consists of a structure obtained by stacking Ni, Co, Pt, Co, Ru, Co, Pt, Co, and Ni layers in this specific order.

Career Highlights

Saki Shibuichi is currently employed at Canon Anelva Corporation, where she continues to develop cutting-edge technologies. Her work has positioned her as a key player in the advancement of magnetoresistance applications.

Collaborations

Some of her notable coworkers include Takuya Seino and Kazumasa Nishimura, who contribute to the innovative environment at Canon Anelva Corporation.

Conclusion

Saki Shibuichi's contributions to magnetoresistance technology highlight her role as an influential inventor in her field. Her patent reflects her innovative spirit and dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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