Company Filing History:
Years Active: 2009-2010
Title: Sairam Sankaranarayanan: Innovator in Optical Measurement Systems
Introduction
Sairam Sankaranarayanan is a notable inventor based in Fremont, CA, specializing in optical measurement systems. He holds 2 patents that contribute significantly to the field of metrology. His work focuses on correcting systematic errors in optical measurement tools, enhancing the accuracy and reliability of measurements in various applications.
Latest Patents
Sairam's latest patents include a method for correcting systematic errors in a metrology system. This method involves measuring a first diffraction spectrum from a standard substrate with a known refractive index and extinction coefficient. By exposing the substrate to a spectrum of electromagnetic energy, a tool-perfect diffraction spectrum is calculated. The hardware systematic error is determined by comparing the measured diffraction spectrum to the calculated one. Subsequently, a second diffraction spectrum from a workpiece is measured and corrected based on the calculated hardware systematic error.
Another significant patent is an optical measurement system designed for systematic error correction. Similar to the previous patent, it involves measuring a first diffraction spectrum from a standard substrate and calculating a tool-perfect diffraction spectrum. The systematic error is calculated, and the second diffraction spectrum from a workpiece is corrected to obtain a more accurate measurement.
Career Highlights
Sairam Sankaranarayanan is currently employed at Tokyo Electron Limited, where he applies his expertise in optical measurement systems. His innovative approaches have made a substantial impact on the efficiency and precision of measurement tools used in various industries.
Collaborations
Sairam has collaborated with notable colleagues such as Sanjeev Kaushal and Kenji Sugishima. Their combined efforts have contributed to advancements in optical measurement technologies.
Conclusion
Sairam Sankaranarayanan's contributions to the field of optical measurement systems through his patents and collaborations highlight his role as an influential inventor. His work continues to pave the way for improved accuracy in metrology applications.