Warangal, India

Sai Deepika Vemula

This inventor holds 1 USPTO granted patent. Top assignee: Raytheon Technologies Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sai Deepika Vemula. Retrieved from https://idiyas.com/inventor/sai-deepika-vemula

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Sai Deepika Vemula

Introduction

Sai Deepika Vemula is a talented inventor based in Warangal, India. She has made significant contributions to the field of fire protection technology. Her innovative approach has led to the development of a unique patent that enhances safety in gas turbine engines.

Latest Patents

One of her notable patents is titled "Retention system for improved fire protection." This fire protection system for a gas turbine engine includes a first fire blanket wall and a second fire blanket wall. The first fire blanket wall is designed for attachment to a first fairing wall, while the second fire blanket wall is configured for attachment to a second fairing wall. An attachment system is also included to secure both fire blanket walls effectively.

Career Highlights

Sai Deepika Vemula is currently employed at Raytheon Technologies Corporation, where she continues to work on innovative solutions in her field. Her dedication to improving safety standards in engineering is evident through her work and patent contributions.

Collaborations

Some of her coworkers include Vishnu Murthy Pendum and Jordan J Franklin, who collaborate with her on various projects within the company.

Conclusion

Sai Deepika Vemula's contributions to fire protection technology exemplify her commitment to innovation and safety. Her patent reflects her expertise and dedication to advancing engineering solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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