Tondabayashi, Japan

Sae Takagi

This inventor holds 2 USPTO granted patents. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1997-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sae Takagi. Retrieved from https://idiyas.com/inventor/sae-takagi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1997-2000

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2 patents (USPTO):Explore Patents

Title: Sae Takagi: Innovator in Semiconductor Technology

Introduction

Sae Takagi is a prominent inventor based in Tondabayashi, Japan. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approach to thin film production.

Latest Patents

Her latest patents include a method for forming a thin semiconductor film and a plasma CVD apparatus. This method involves placing a group-IV compound or a derivative in a plasma state, decomposing it into active species, and depositing these species on a substrate. The process is characterized by the intermittent supply of energy for generating plasma, which is carefully timed to optimize the reaction rates.

Career Highlights

Sae Takagi is associated with Sharp Kabushiki Kaisha Corporation, where she applies her expertise in semiconductor technology. Her work has been instrumental in advancing the methods used in the production of thin semiconductor films.

Collaborations

She collaborates with notable coworkers, including Takashi Tomita and Katsuhiko Nomoto, contributing to a dynamic team focused on innovation in the semiconductor industry.

Conclusion

Sae Takagi's contributions to semiconductor technology through her patents and work at Sharp Kabushiki Kaisha Corporation highlight her role as a leading inventor in her field. Her innovative methods continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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