Hachioji, Japan

Sadatsugu Terada

This inventor holds 1 USPTO granted patent. Top assignee: Konishiroku Photo Industry Co., Ltd.. Active years: 1976.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sadatsugu Terada. Retrieved from https://idiyas.com/inventor/sadatsugu-terada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1976

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sadatsugu Terada

Introduction

Sadatsugu Terada is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of photography through his innovative patents. His work primarily focuses on enhancing the quality and functionality of photosensitive materials.

Latest Patents

One of Terada's key patents is titled "Method of antistatic treatment for silver halide photosensitive materials." This patent involves supported silver halide photosensitive materials that comprise an antistatic additive. The additive is a glycidol poly-addition product of a phenol-aldehyde condensate. This innovation aims to improve the performance and reliability of photographic materials.

Career Highlights

Terada is associated with Konishiroku Photo Industry Co., Ltd., a company known for its advancements in photographic technology. His work has contributed to the development of more efficient and effective photographic products. With a total of 1 patent, Terada's contributions are recognized within the industry.

Collaborations

Throughout his career, Terada has collaborated with notable colleagues, including Norio Chiba and Masao Ishihara. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Sadatsugu Terada's work exemplifies the spirit of innovation in the field of photography. His contributions, particularly in the area of antistatic treatments for photosensitive materials, have had a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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