Location History:
- Inagi, JP (1981 - 1983)
- Tokyo, JP (1984 - 1987)
Company Filing History:
Years Active: 1981-1987
Title: Sadao Matsumura: Innovator in Surface Acoustic Wave Devices
Introduction
Sadao Matsumura is a notable inventor based in Inagi, Japan. He has made significant contributions to the field of surface acoustic wave devices, holding a total of 6 patents. His work has advanced the technology used in various electronic applications.
Latest Patents
Matsumura's latest patents include a surface acoustic wave device that features a surface acoustic wave filter. This filter is designed with multiple electroacoustic interdigital electrodes formed as thin films primarily made of aluminum on a Li₂B₄O₇ single crystal substrate. Additionally, he has developed a surface acoustic wave resonator that incorporates grating reflectors for reflecting surface acoustic waves. The design ensures that the cut angle of the substrate and the propagation direction of the surface acoustic wave are optimized, achieving a temperature coefficient of frequency (TCD) below ±5 ppm/°C and a coupling coefficient K² of about 1.0%. Furthermore, he has patented a method for controlling the shape of a single crystal, which involves detecting the weight of a single crystal pulled by the Czochralski method and adjusting the heating power supplied to the crucible to maintain a constant growing angle.
Career Highlights
Throughout his career, Matsumura has worked with prominent companies such as Tokyo Shibaura Denki Kabushiki Kaisha and Tokyo Shibaura Electric Co., Ltd. His experience in these organizations has contributed to his expertise in the field of crystal growth and acoustic wave technology.
Collaborations
Matsumura has collaborated with notable coworkers, including Hitoshi Hirano and Hitoshi Suzuki. Their joint efforts have furthered advancements in their respective fields.
Conclusion
Sadao Matsumura's innovative work in surface acoustic wave devices and crystal growth methods has made a lasting impact on technology. His contributions continue to influence the development of electronic applications worldwide.
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