Company Filing History:
Years Active: 2016
Title: The Innovative Contributions of Sachie Ishibashi
Introduction
Sachie Ishibashi is a notable inventor based in Miyagi, Japan. She has made significant contributions to the field of plasma processing technology. Her innovative work has led to the development of a unique plasma processing apparatus that enhances the efficiency of gas supply in processing chambers.
Latest Patents
Sachie Ishibashi holds a patent for a plasma processing apparatus. This apparatus features an upper electrode arranged within a processing chamber, which includes multiple gas supplying zones. The design incorporates a branch pipe with several branch parts and an addition pipe connected to at least one of these branches. The upper electrode is responsible for supplying a processing gas, including a main gas, to the processing chamber through the gas supplying zones. The branch pipe divides the processing gas according to a predetermined flow rate ratio, ensuring that the divided gas is effectively supplied to the gas supplying zones. Additionally, the addition pipe allows for the introduction of an adjustment gas, while a gas flow path connected to the branch part includes a bending portion to prevent gas concentration variations based on the molecular weight ratio of the adjustment gas to the main gas.
Career Highlights
Sachie Ishibashi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. Her work at this esteemed organization has allowed her to further her research and development efforts in plasma processing technologies.
Collaborations
Throughout her career, Sachie has collaborated with talented individuals such as Yusei Kuwabara and Nobuaki Shindo. These collaborations have contributed to her innovative projects and have fostered a creative environment for technological advancements.
Conclusion
Sachie Ishibashi's contributions to plasma processing technology exemplify her dedication to innovation and excellence. Her patent and work at Tokyo Electron Limited highlight her role as a significant figure in the field.