Tokyo, Japan

Saburo Ishibashi

This inventor holds 1 USPTO granted patent. Top assignee: Tdk Electronics Company, Limited. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Saburo Ishibashi. Retrieved from https://idiyas.com/inventor/saburo-ishibashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: The Innovations of Saburo Ishibashi

Introduction

Saburo Ishibashi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of electrolysis through his innovative patent. His work focuses on the development of advanced electrode materials, which are crucial for various electrochemical applications.

Latest Patents

Ishibashi holds a patent for a "Process for preparing insoluble electrode." This invention involves the preparation of an insoluble electrode for electrolysis by coating a solution or slurry that comprises palladium oxide and a platinum compound. The process includes drying and baking the coated conductive substrate at elevated temperatures, which enhances the electrode's performance.

Career Highlights

Saburo Ishibashi is associated with TDK Electronics Company, Limited, where he has been instrumental in advancing the company's technological capabilities. His expertise in electrochemical processes has contributed to the development of innovative products that meet the demands of modern technology.

Collaborations

Ishibashi has collaborated with esteemed colleagues such as Shunjiro Saito and Nobuei Shimojo. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Saburo Ishibashi's contributions to the field of electrolysis through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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