Company Filing History:
Years Active: 2020
Title: Sabrina Lohmüller: Innovator in Semiconductor Technology
Introduction
Sabrina Lohmüller is a prominent inventor based in Freiburg, Germany. She has made significant contributions to the field of semiconductor technology, particularly through her innovative methods for doping semiconductor substrates. Her work is essential for advancing the capabilities of electronic devices.
Latest Patents
Sabrina holds a patent for a "Method for doping semiconductor substrates by means of a co-diffusion process and doped semiconductor substrate produced by means of said method." This invention relates to a method for doping semiconductor substrates using a co-diffusion process. The process involves coating semiconductor substrates on at least one side with a layer containing at least one first dopant. Two of these substrates are then arranged in a process chamber so that the coated sides are brought into direct contact, enhancing the efficiency of the doping process.
Career Highlights
Sabrina is affiliated with the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung E.V., a leading research organization in Germany. Her work at this institution has allowed her to explore and develop innovative solutions in semiconductor technology.
Collaborations
Sabrina collaborates with notable colleagues, including Philip Rothhardt and Andreas Wolf. Their combined expertise contributes to the advancement of research and development in their field.
Conclusion
Sabrina Lohmüller is a key figure in semiconductor innovation, with her patented methods paving the way for future advancements in technology. Her contributions are vital for the ongoing evolution of electronic devices.