Dreieich, Germany

Sabine Rapp

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sabine Rapp. Retrieved from https://idiyas.com/inventor/sabine-rapp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Sabine Rapp: Innovator in Flexographic Printing Technology

Introduction

Sabine Rapp is a notable inventor based in Dreieich, Germany. She has made significant contributions to the field of printing technology, particularly in the development of flexographic printing plates. Her innovative approach has led to advancements that enhance the efficiency and quality of printing processes.

Latest Patents

Sabine Rapp holds a patent for a "Process for preparing a flexographic printing plate." This patent describes a method that involves providing a photosensitive element with a support and at least one photopolymerizable layer. The process includes the use of a photomask and exposure to ultraviolet radiation to create a relief surface suitable for printing. This innovation is crucial for improving the quality and precision of flexographic printing.

Career Highlights

Rapp is associated with E.I. du Pont de Nemours and Company, a leading organization in the field of materials science and technology. Her work at this company has allowed her to collaborate with other experts and contribute to groundbreaking advancements in printing technology.

Collaborations

One of her notable collaborators is Thies Knudsen. Together, they have worked on projects that push the boundaries of flexographic printing and enhance the capabilities of the technology.

Conclusion

Sabine Rapp's contributions to flexographic printing technology exemplify her innovative spirit and dedication to advancing the field. Her patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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