Ome, Japan

Saadyuki Okudaira

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Saadyuki Okudaira: Innovator in Plasma Treatment Technology

Introduction

Saadyuki Okudaira is a notable inventor based in Ome, Japan. He has made significant contributions to the field of plasma treatment technology. His innovative approach has led to the development of a unique method and apparatus for plasma treatment.

Latest Patents

Okudaira holds a patent for a "Plasma treating method and apparatus therefor." This invention relates to a plasma treating method that involves forming a treating gas into a plasma under reduced pressure. The method utilizes the plasma to treat a specimen that is cooled to a low temperature of less than 0 degrees Celsius. The apparatus includes a treating chamber, means for reducing and exhausting the chamber's interior, and a specimen table designed to maintain the specimen at optimal conditions.

Career Highlights

Saadyuki Okudaira is associated with Hitachi, Ltd., where he has been able to apply his expertise in plasma technology. His work has focused on enhancing the efficiency and effectiveness of plasma treatment processes. With a patent count of 1 patent, he has established himself as a key figure in this innovative field.

Collaborations

Throughout his career, Okudaira has collaborated with esteemed colleagues such as Yoshinao Kawasaki and Shinichi Tachi. These partnerships have contributed to the advancement of plasma treatment technologies and have fostered a collaborative environment for innovation.

Conclusion

Saadyuki Okudaira's contributions to plasma treatment technology exemplify the impact of innovative thinking in the field of engineering. His patented methods and collaborative efforts continue to influence advancements in this area.

Profile summary based on public USPTO records.
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