Munich, Germany

Rüdiger Smolka

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Merck Patent Gesellschaft MIT Beschraenkter Haftung. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rüdiger Smolka. Retrieved from https://idiyas.com/inventor/rüdiger-smolka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Rüdiger Smolka: Innovator in Laser-Engraved Printing Technology

Introduction

Rüdiger Smolka is a notable inventor based in Munich, Germany. He has made significant contributions to the field of printing technology, particularly through his innovative use of laser-engraved printing forms.

Latest Patents

Rüdiger Smolka holds a patent for the "Use of laser-engraved printing forms." This invention relates to the application of laser-engraved printing forms for printing with inks in a gravure printing process. The printing inks utilized in this process are pigmented with flake-form effect pigments, enhancing the quality and effectiveness of the printing.

Career Highlights

Rüdiger Smolka is associated with Merck Patent Gesellschaft mit beschränkter Haftung, where he has been instrumental in advancing printing technologies. His work has led to innovative solutions that improve the gravure printing process.

Collaborations

Throughout his career, Rüdiger has collaborated with notable colleagues, including Andreas Becker and Thomas Rathschlag. These partnerships have contributed to the development of cutting-edge printing technologies.

Conclusion

Rüdiger Smolka's contributions to laser-engraved printing technology exemplify his innovative spirit and dedication to advancing the field. His patent and collaborations highlight the importance of teamwork in achieving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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