Koganei, Japan

Ryuzo Ohmukai


Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Tokyo, JP (2004)
  • Koganei, JP (2004 - 2006)

Company Filing History:


Years Active: 2004-2006

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ryuzo Ohmukai

Introduction

Ryuzo Ohmukai is a prominent inventor based in Koganei, Japan. He has made significant contributions to the field of atomic lithography, with a total of 3 patents to his name. His work focuses on advanced methods for manufacturing atomic structures, which have implications in various technological applications.

Latest Patents

Ohmukai's latest patents include an atomic lithography apparatus that utilizes the electro-optic effect. This apparatus is designed for depositing atoms from an atomic beam onto a substrate to create periodic atomic structures. It features an atomic oven with a pinhole, a collimator for generating an atomic beam, and multiple lasers that control the spreading angle of the beam. Additionally, it incorporates electro-optic elements that manage the phases of the optical standing wave, allowing for precise control over the propagation direction of the atomic beam.

Another notable patent is the method of forming a fine pattern on a substrate. This method involves irradiating the substrate with a beam of atoms at a slow velocity, allowing them to be adsorbed. A laser beam, detuned from the resonant frequency of the atoms, is projected onto the substrate, resulting in total reflection. This technique enables the creation of atomic fabrication patterns that can achieve sizes corresponding to the diffraction limit of the laser light.

Career Highlights

Throughout his career, Ryuzo Ohmukai has worked with esteemed organizations such as the Communications Research Laboratory and the National Institute of Information and Communications Technology. His experience in these institutions has contributed to his expertise in the field of atomic lithography and related technologies.

Collaborations

Ohmukai has collaborated with notable individuals in his field, including Masayoshi Watanabe. Their joint efforts have further advanced the research and development of atomic fabrication techniques.

Conclusion

Ryuzo Ohmukai's innovative work in atomic lithography has paved the way for advancements in manufacturing atomic structures. His patents reflect a deep understanding of the electro-optic effects and their applications in technology. His contributions continue to influence the field and inspire future innovations.

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