The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Aug. 27, 2001
Ryuzo Ohmukai, Koganei, JP;
Communications Research Laboratory, Koganei, JP;
Abstract
The surface of a substrate having a transmission index is irradiated with a beam of atoms having a slow enough velocity to be adsorbed on the substrate. A laser beam whose frequency is detuned by 1 to 10 gigahertz from the resonant frequency of the atoms is projected onto the substrate at an angle, producing total reflection. The atom beam is reflected at regions at which an intensity of an evanescent wave emitted at this time from the substrate surface is high, and adsorbed at regions where the intensity is low, thereby achieving atomic fabrication patterns on a substrate. By using a hologram image to create the pattern, it is possible to form an atomic fabrication patterns in which the size of features correspond to the diameter of the laser beam, enabling the size to be reduced to the diffraction limit of the laser light.