This inventor holds 1 USPTO granted patent. Top assignee: Seibu Giken Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Ryuzi Kuramitsu: Innovator in Gas Concentration Technology
Introduction
Ryuzi Kuramitsu is a notable inventor based in Fukuoka-ken, Japan. He has made significant contributions to the field of gas concentration technology. His innovative approach has led to the development of a unique gas concentration device that enhances efficiency in gas processing.
Latest Patents
Ryuzi Kuramitsu holds a patent for a gas concentrator. This device features a gas adsorbing element and a heat exchanger. The gas adsorbing element is divided into an adsorbing zone and a desorbing zone. The heat exchanger consists of first and second flow channels, which are separated from each other. The first flow channels receive foggy air containing minute water particles, cooling the process air flowing through the second flow channels. This process utilizes the heat of vaporization to evaporate the water particles. The cooled process air is then directed to the adsorbing zone of the gas adsorbing element. Additionally, the gas adsorbing element may include a cooling zone, allowing for dynamic changes in the adsorbing, desorbing, and cooling zones as the rotor rotates.
Career Highlights
Ryuzi Kuramitsu is associated with Seibu Giken Co., Ltd., where he continues to innovate in gas concentration technologies. His work has been instrumental in advancing the efficiency of gas processing systems.
Collaborations
Ryuzi collaborates with talented coworkers, including Yukito Kawakami and Hiroaki Izumi. Their combined expertise contributes to the success of their projects and innovations.
Conclusion
Ryuzi Kuramitsu is a pioneering inventor whose work in gas concentration technology has made a significant impact. His innovative gas concentrator showcases his commitment to enhancing efficiency in gas processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
