Company Filing History:
Years Active: 2001-2002
Title: Ryuusaku Takahashi: Innovator in Novolak Resin Technology
Introduction
Ryuusaku Takahashi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of novolak resin technology. With a total of two patents to his name, his work has implications for various applications in the semiconductor industry.
Latest Patents
Takahashi's latest patents focus on novolak resin precursors and positive photoresist compositions. The novolak resin precursor is composed of bonded phenolic moieties, where one of the hydrogen atoms in the o- or p-positions relative to the hydroxy group of each phenolic moiety is substituted with an alkyl or alkenyl group having 1 to 3 carbon atoms. The other two hydrogen atoms are bonded through methylene bonds. The content of ortho-ortho bonding is maintained at 30 to 70% relative to the total number of methylene bonds, and the weight average molecular weight of the precursor ranges from 300 to 10,000. The novolak resin derived from this precursor is utilized in a positive photoresist composition that exhibits reduced binuclear compounds, minimizes scum formation, and enhances definition and coating performance, ultimately providing a resist pattern with satisfactory heat resistance.
Career Highlights
Takahashi is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company renowned for its innovations in the chemical industry. His work has been instrumental in advancing the capabilities of photoresist materials, which are critical in the manufacturing of semiconductors.
Collaborations
Throughout his career, Takahashi has collaborated with notable colleagues such as Ken Miyagi and Kousuke Doi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ryuusaku Takahashi's contributions to novolak resin technology and photoresist compositions highlight his role as a key innovator in the field. His patents reflect a commitment to advancing material science, which is essential for the future of semiconductor manufacturing.
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