Sagamihara, Japan

Ryuta Ohno

This inventor holds 1 USPTO granted patent. Top assignees: Kaken Pharmaceutical Company, Ltd., Sagami Chemical Research Center. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuta Ohno. Retrieved from https://idiyas.com/inventor/ryuta-ohno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ryuta Ohno

Introduction

Ryuta Ohno is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of chemical processes, particularly with his innovative patent. His work has had a lasting impact on the industry, showcasing his expertise and dedication to advancing technology.

Latest Patents

Ryuta Ohno holds a patent for a process for the preparation of 3-(substituted). This patent highlights his ability to develop new methodologies that can enhance chemical production and applications.

Career Highlights

Throughout his career, Ryuta Ohno has worked with esteemed organizations such as Sagami Chemical Research Center and Kaken Pharmaceutical Company, Ltd. His experience in these companies has allowed him to refine his skills and contribute to various projects that push the boundaries of innovation.

Collaborations

Ryuta Ohno has collaborated with talented individuals in his field, including Kenji Hirai and Katsuyuki Masuda. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in their respective areas of expertise.

Conclusion

Ryuta Ohno's contributions to the field of chemical processes through his patent and collaborations with industry professionals demonstrate his commitment to innovation. His work continues to inspire future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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