This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignee: Agc Inc.. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2025
Title: The Innovative Contributions of Ryusuke Oishi
Introduction
Ryusuke Oishi is a prominent inventor based in Fukushima, Japan. He has made significant contributions to the field of reflective mask technology, particularly in the manufacturing of advanced materials used in semiconductor production. With a total of three patents to his name, Oishi's work is at the forefront of innovation in this critical industry.
Latest Patents
Oishi's latest patents include the reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask. The reflective mask blank consists of a substrate, a multilayer reflective film that effectively reflects EUV light, a protection film that safeguards the multilayer reflective film, and an absorption film that absorbs the EUV light, arranged in that specific order. Notably, the protection film contains 50 at % or more of Rh. When a band-shaped gray scale image is obtained by imaging a cross-section of the protection film with a transmission electron microscope (TEM), the luminance profile of the gray scale image reveals a number of peaks per 100 nm in the longitudinal direction of the gray scale image that is 50 or more.
Career Highlights
Oishi is currently employed at AGC Inc., where he continues to push the boundaries of technology in the semiconductor field. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of reflective masks used in extreme ultraviolet lithography.
Collaborations
Some of Oishi's notable coworkers include Takuma Kato and Daijiro Akagi. Their collaborative efforts contribute to the ongoing success and innovation within their projects.
Conclusion
Ryusuke Oishi's contributions to the field of reflective mask technology exemplify the spirit of innovation. His patents and work at AGC Inc. highlight the importance of advanced materials in the semiconductor industry. Oishi's dedication to his craft continues to inspire advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile