Tokyo, Japan

Ryuma Takashi

This inventor holds 3 USPTO granted patents. Top assignees: Hitachi, Ltd., Showa Denko K.k.. Active years: 1993-1996.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 3

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1993-1996

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3 patents (USPTO):Explore Patents

Title: Ryuma Takashi: Innovator in Electrification Suppression

Introduction

Ryuma Takashi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of electrification suppression, holding a total of 3 patents. His work focuses on developing methods and materials that effectively reduce electrification, which is crucial in various technological applications.

Latest Patents

Takashi's latest patents include a processed substrate obtained by a process for effecting suppression of electrification. This innovation involves a water-soluble electrification-suppressing film that possesses electron conductivity and is composed of a polymer resin. The film provides a high electrification-suppressing effect, even in vacuum conditions, while minimizing contamination. Another patent details a method for suppression of electrification, reiterating the effectiveness of the water-soluble film in achieving these results.

Career Highlights

Throughout his career, Ryuma Takashi has worked with prominent companies such as Hitachi, Ltd. and Showa Denko K.K. His experience in these organizations has allowed him to refine his expertise in the field of electrification suppression and contribute to innovative solutions.

Collaborations

Takashi has collaborated with notable coworkers, including Fumio Murai and Yasunori Suzuki. These partnerships have likely enhanced his research and development efforts, leading to successful innovations.

Conclusion

Ryuma Takashi's work in electrification suppression showcases his dedication to innovation and technology. His patents reflect a commitment to advancing methods that improve efficiency and reduce contamination in various applications.

Profile summary based on public USPTO records.
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