Okazaki, Japan

Ryuji Sakaida

This inventor holds 1 USPTO granted patent. Top assignee: Futaba Industrial Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuji Sakaida. Retrieved from https://idiyas.com/inventor/ryuji-sakaida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ryuji Sakaida and an Exhaust Component Invention.

Introduction

Ryuji Sakaida is an inventor associated with Futaba Industrial Co., Ltd. and based in Okazaki, Japan. His listed patent concerns an exhaust component designed to guide exhaust gas through connected flow paths.

Latest Patents

Sakaida’s listed patent, “Exhaust component,” describes a first member that forms a flow path and a second member that forms a narrower flow path. A through hole in the first member allows exhaust gas to pass into the second flow path. Around the hole, a curved edge protrudes outward from the first member. The second member’s upstream end joins to the hole-forming portion and covers its outer surface, creating a connection for the gas flow. The supplied information lists 1 patent for Sakaida.

Career Highlights

The available information identifies Sakaida’s work in connection with Futaba Industrial Co., Ltd. His listed invention focuses on the structure and connection of exhaust-system components.

Collaborations

The patent information associates Sakaida’s exhaust-component invention with Futaba Industrial Co., Ltd. No additional collaborators are specified in the supplied details.

Conclusion

Ryuji Sakaida’s listed patent presents a structural approach to directing exhaust gas between flow paths of different cross-sectional areas, reflecting his documented inventive work with Futaba Industrial Co., Ltd.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…