Ryuji Ohno

**Title: The Innovations of Ryuji Ohno: A Pioneer in Semiconductor Technology**

Introduction

Ryuji Ohno, a talented inventor based in Saitama, Japan, has made significant contributions to the field of semiconductor technology. With three patents to his name, Ohno's work focuses on evaluating metal contamination and improving the manufacturing processes of silicon wafers. His inventions exemplify his commitment to advancing semiconductor materials and methods.

Latest Patents

Ohno's latest patents cover two critical methods in semiconductor technology. The first patent is titled "Method of Evaluating Metal Contamination in Semiconductor Sample." This innovative method employs a Deep Level Transient Spectroscopy (DLTS) approach to assess metal contamination levels in semiconductor samples. The process involves measuring DLTS signals under varying temperatures and applying a reverse voltage to form a depletion layer, thus enabling precise evaluation.

The second patent, "Method of Analyzing Iron Concentration of Boron-Doped P-Type Silicon Wafer," presents a unique approach using the Surface Photovoltage (SPV) method. This technique analyzes iron concentration based on the changes in minority carrier diffusion length following the separation processing of the wafer when irradiated with light. Ohno's method provides a reliable calculation equation that incorporates factors affecting minority carrier dynamics.

Career Highlights

Throughout his career, Ryuji Ohno has established himself as a key figure in semiconductor research. His affiliation with Sumco Corporation has provided him with the platform to develop and patent groundbreaking technologies that enhance semiconductor manufacturing. His patents not only contribute to theoretical advancements but also have practical implications in the production of high-quality silicon wafers.

Collaborations

In his journey as an inventor, Ohno has collaborated with talented colleagues, including Shin Uchino and Masataka Hourai. These partnerships have enriched his research endeavors, fostering a collaborative environment that encourages innovation within the field.

Conclusion

Ryuji Ohno stands out as a remarkable inventor in semiconductor technology. His contributions through patented methods for evaluating and manufacturing semiconductor materials demonstrate his expertise and pioneering spirit. As the semiconductor industry continues to evolve, inventors like Ohno play a crucial role in driving advancements that shape the technology of the future. With his dedication and ingenuity, Ryuji Ohno continues to inspire future generations of inventors and researchers.