Company Filing History:
Years Active: 2020
Title: Ryuji Mitsuhashi: Innovator in Pattern Measurement Technology
Introduction
Ryuji Mitsuhashi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern measurement technology. His innovative work focuses on enhancing the accuracy and efficiency of pattern evaluation methods.
Latest Patents
Mitsuhashi holds a patent for a "Pattern measurement device, and computer program for measuring pattern." The purpose of this invention is to provide a device that adequately evaluates patterns formed by methods that do not utilize a photomask. The device includes a computation mechanism that measures dimensions between patterns on a sample. It extracts the centroid of the pattern from data obtained through beam irradiation and executes a position alignment process with measurement reference data. This allows for precise measurement of dimensions between the measurement reference data and the pattern's edge or centroid.
Career Highlights
Ryuji Mitsuhashi is associated with Hitachi High-Technologies Corporation, where he applies his expertise in developing advanced measurement technologies. His work has been instrumental in improving the capabilities of pattern measurement devices.
Collaborations
Mitsuhashi has collaborated with notable colleagues such as Satoru Yamaguchi and Norio Hasegawa. Their combined efforts contribute to the advancement of technology in their field.
Conclusion
Ryuji Mitsuhashi's innovative contributions to pattern measurement technology highlight his role as a key inventor in this specialized area. His patent reflects a commitment to enhancing measurement accuracy and efficiency in various applications.