Company Filing History:
Years Active: 2021-2023
Title: Ryuji Hisatomi: Innovator in Plasma Processing Technology
Introduction
Ryuji Hisatomi is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses.
Latest Patents
His latest patents include a plasma processing apparatus and control method. This innovative apparatus consists of a processing container, an electrode for placing a substrate, a plasma generation source, and a bias power supply. The design also features a part exposed to the plasma, a DC power supply for voltage application, and a controller that executes a specific control procedure. This procedure involves alternating between two states of DC voltage, optimizing the processing conditions for the substrate.
Career Highlights
Ryuji Hisatomi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His expertise in plasma processing has positioned him as a key player in advancing technologies that are critical for modern manufacturing processes.
Collaborations
He has collaborated with notable coworkers such as Chishio Koshimizu and Michishige Saito, contributing to various projects that enhance the capabilities of plasma processing technologies.
Conclusion
Ryuji Hisatomi's contributions to plasma processing technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of manufacturing processes.