Kanagawa, Japan

Ryuchiro Maruyama

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuchiro Maruyama. Retrieved from https://idiyas.com/inventor/ryuchiro-maruyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Ryuchiro Maruyama: Innovator in Carbon Nanotube Technology

Introduction

Ryuchiro Maruyama is a prominent inventor based in Kanagawa, Japan. He is known for his significant contributions to the field of nanotechnology, particularly in the development of carbon nanotube structures. His innovative work has garnered attention in both academic and industrial circles.

Latest Patents

One of Maruyama's notable patents is for a single-wall carbon nanotube heterojunction. This invention involves a unique configuration where a semiconductive single-wall carbon nanotube and a metallic single-wall carbon nanotube are joined together in a longitudinal direction. This advancement has potential applications in various electronic devices and materials.

Career Highlights

Maruyama is currently associated with Sony Corporation, where he continues to push the boundaries of technology. His work at Sony has allowed him to collaborate with other talented individuals in the field, contributing to the company's innovative projects.

Collaborations

Some of his notable coworkers include Toshinori Iwai and Hisashi Kajiura. Their combined expertise has fostered a collaborative environment that enhances the development of cutting-edge technologies.

Conclusion

Ryuchiro Maruyama's contributions to carbon nanotube technology exemplify the spirit of innovation. His work not only advances scientific understanding but also paves the way for future technological breakthroughs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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