Ryu Kaiwara

Title: Ryu Kaiwara: Innovator in Plasma Technology

Introduction

Ryu Kaiwara is a notable inventor based in Miyagi-ken, Japan. He has made significant contributions to the field of plasma technology, holding a total of 4 patents. His innovative work focuses on enhancing plasma processing methods and devices.

Latest Patents

One of Ryu Kaiwara's latest patents is a plasma method with high input power. This plasma device features a container, a gas supply system, and an exhaust system. The container is constructed with a first dielectric plate that can transmit microwaves. An antenna for radiating microwaves is positioned outside the container, while an electrode for holding the object to be treated is located inside. The microwave radiating surface of the antenna and the surface of the object are aligned in parallel and opposite to each other. Additionally, the wall section of the container, excluding the first dielectric plate, is made from a material with higher electrical conductivity than aluminum, or it is covered with such a material. The thickness of this member exceeds (2/μσ), where σ, μ, and ω represent the electrical conductivity of the member, the permeability of vacuum, and the angular frequency of the microwaves, respectively.

Another significant patent is the plasma process apparatus, which is designed to uniform the density of the generated plasma and the associated self-bias voltage. This apparatus includes two parallel plate electrodes, one of which is configured to carry a substrate for plasma processing. It also features a magnetic field applying means that generates a horizontal and one-directional magnetic field on the substrate's surface. An auxiliary electrode is positioned around the periphery of one of the electrodes, receiving high-frequency power. The alignment of these electrodes creates a space where plasma can be excited for substrate processing.

Career Highlights

Throughout his career, Ryu Kaiwara has worked with various organizations, including the Foundation for Advancement of International Science. His expertise in plasma technology has positioned him as a key figure in the field.

Collaborations

Ryu has collaborated with notable individuals such as Takahisa Nitta and Masaki Hirayama. Their combined efforts have contributed to advancements in plasma processing technologies.

Conclusion

Ryu Kaiwara's innovative work in plasma technology has led to the development of advanced methods and devices that enhance plasma processing. His contributions are significant in the field,