Mie, Japan

Ryozo Hamana

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Chemical Corporation. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryozo Hamana. Retrieved from https://idiyas.com/inventor/ryozo-hamana-m2kjxr13

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Ryozo Hamana: Innovator in Styrene Production

Introduction

Ryozo Hamana is a notable inventor based in Mie, Japan. He has made significant contributions to the field of chemical engineering, particularly in the production of styrene. His innovative approach has led to the development of a patented process that enhances the efficiency of styrene production.

Latest Patents

Ryozo Hamana holds 1 patent for his invention titled "Process for producing styrene." This patent reflects his expertise and commitment to advancing chemical processes in the industry.

Career Highlights

Hamana is currently employed at Mitsubishi Chemical Corporation, a leading company in the chemical sector. His work at Mitsubishi has allowed him to apply his innovative ideas and contribute to the company's success in the market.

Collaborations

Throughout his career, Ryozo Hamana has collaborated with talented individuals such as Shohei Suzuki and Syuji Obayashi. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in their respective fields.

Conclusion

Ryozo Hamana's contributions to the field of chemical engineering, particularly through his patented process for producing styrene, highlight his role as an innovator. His work at Mitsubishi Chemical Corporation and collaborations with esteemed colleagues further emphasize his impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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