Tokyo, Japan

Ryouei Nozawa

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Science Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryouei Nozawa. Retrieved from https://idiyas.com/inventor/ryouei-nozawa-9bsmc9hn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Ryouei Nozawa: Innovator in Coating Thickness Measurement

Introduction

Ryouei Nozawa is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of measurement technology, particularly in the development of innovative devices that enhance precision and efficiency.

Latest Patents

Ryouei Nozawa holds a patent for a Fluorescent X-ray coating thickness gauge. This invention represents a significant advancement in the ability to measure coating thickness accurately, which is crucial in various industrial applications.

Career Highlights

Nozawa is currently employed at Hitachi High-Tech Science Corporation, where he continues to work on cutting-edge technologies. His expertise in measurement technology has made him a valuable asset to the company and the industry as a whole.

Collaborations

Throughout his career, Ryouei Nozawa has collaborated with notable colleagues, including Isao Yagi and Toshiyuki Takahara. These partnerships have fostered innovation and contributed to the success of various projects.

Conclusion

Ryouei Nozawa's work in the field of measurement technology, particularly with his patented Fluorescent X-ray coating thickness gauge, showcases his commitment to innovation and excellence. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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