Kanagawa, Japan

Ryou Kikuchi


 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2021

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2 patents (USPTO):Explore Patents

Title: Ryou Kikuchi: Innovator in Gallium Nitride Technology

Introduction

Ryou Kikuchi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of gallium nitride technologies. With a total of 2 patents, Kikuchi's work has the potential to impact various applications in electronics and optoelectronics.

Latest Patents

Kikuchi's latest patents focus on the creation of gallium nitride sintered bodies and molded articles. His first patent describes a gallium nitride sintered body characterized by a density of 2.5 g/cm³ to less than 5.0 g/cm³. This invention also features an intensity ratio of the gallium oxide peak of the (002) plane to the gallium nitride peak of the (002) plane of less than 3%, as determined by X-ray diffraction analysis. The second patent presents a metal gallium-impregnated gallium nitride molded article, which consists of a gallium nitride phase and a metal gallium phase that exist as separate phases. This molded article has a molar ratio of Ga/(Ga+N) ranging from 55% to 80%.

Career Highlights

Ryou Kikuchi is currently employed at Tosoh Corporation, where he continues to advance his research in gallium nitride materials. His work is instrumental in enhancing the properties of gallium nitride, making it more suitable for various industrial applications.

Collaborations

Kikuchi collaborates with esteemed colleagues such as Masami Mesuda and Keitaro Matsumaru. Their combined expertise contributes to the innovative advancements in gallium nitride technology.

Conclusion

Ryou Kikuchi's contributions to gallium nitride technology exemplify the importance of innovation in materials science. His patents reflect a commitment to developing high-density materials with low oxygen content, paving the way for future advancements in the field.

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