Osaka, Japan

Ryou Hashimoto


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:

goldMedal2 out of 832,680 
Other
 patents

Years Active: 2004

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Ryou Hashimoto: Pioneering Semiconductor Cleaning Solutions

Introduction

Ryou Hashimoto is a notable inventor based in Osaka, Japan, recognized for his significant contributions to the field of semiconductor technology. With a total of two patents to his name, Hashimoto's innovations focus on improving cleaning processes crucial for the manufacturing of integrated circuits and liquid crystal displays.

Latest Patents

Among his latest patents, Hashimoto developed a photoresist stripping composition and process, aimed at efficiently removing residues from photoresist used as etching masks. This cleaning agent consists of 0.1 to 60% by weight of an oxidizing agent and 0.0001 to 5% by weight of a chelating agent. His innovative approach allows for the easy removal of residues formed from photoresist after dry etching. This patent is particularly beneficial for the semiconductor integrated circuits and liquid crystal display panels, where remnants from conductive thin films can also be effectively eliminated without corroding the underlying wiring or insulating materials.

Career Highlights

Ryou Hashimoto has established himself as a valuable inventor in the semiconductor industry. His focus on creating efficient cleaning processes has positioned him as an essential contributor to advancements in manufacturing technologies. With a strong emphasis on minimizing material damage during the cleaning process, his work is making significant impacts on production efficiency.

Collaborations

Throughout his career, Hashimoto has collaborated with fellow innovators such as Hisaki Abe and Taketo Maruyama. Working with talented colleagues allows for the exchange of ideas that fosters the creative process necessary for groundbreaking inventions in the evolving technology landscape.

Conclusion

Ryou Hashimoto stands out as a prominent figure in the innovation of cleaning technologies for semiconductor manufacturing. His patented solutions are set to enhance production efficiency while preserving the integrity of essential materials. As the industry continues to evolve, Hashimoto's work will undoubtedly play a crucial role in shaping the future of semiconductor production processes.

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