Other

Ryou Hashimoto

Taketo Maruyama

Hisaki Abe

Tetsuo Aoyama

Taimi Oketani

Hijiri Nakahara

Masahiro Nohara

Yukihiko Takeuchi

Photoresist stripping composition and process for stripping resist

A cleaning agent which comprises 0.1 to 60% by weight of an oxidizing agent and 0.0001 to 5% by weight of a chelating agent. In the process for producing semiconductor integrated circuits, a pattern layer of a photoresist used as an etching mask and residues formed from the photoresist by dry etching can be easily removed with the cleaning agent. In the process for producing substrates for liquid crystal display panels, residues derived from a conductive thin film formed by dry etching can also be easily removed. In the cleaning processes using the cleaning agent, wiring materials or insulating materials in thin film circuit devices or other materials used for producing substrates of semiconductor integrated circuits and liquid crystal panels are not corroded.

Cleaning agent and cleaning process using the same

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Osaka, Japan

Ryou Hashimoto