Ryota Ueno

Title: Innovations of Ryota Ueno in Semiconductor Technology

Introduction

Ryota Ueno is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced methods for processing substrates and manufacturing semiconductor devices.

Latest Patents

Ueno's latest patents include innovative techniques for substrate processing. One of his patents describes a method of processing a substrate that involves etching a first film exposed on the surface of the substrate. This process is performed by executing a cycle a predetermined number of times. The cycle includes non-simultaneously forming a first modified layer on the surface of the first film by supplying a first gas to the substrate. Additionally, it involves etching at least a portion of the first film with an etching species generated by supplying a second gas with a different molecular structure. This technique allows for the reaction and activation of the first modified layer, enhancing the efficiency of semiconductor manufacturing.

Career Highlights

Ryota Ueno is currently employed at Kokusai Electric Corporation, where he continues to develop innovative solutions in semiconductor technology. His expertise and dedication to research have positioned him as a key figure in his field.

Collaborations

Ueno collaborates with talented coworkers, including Kimihiko Nakatani and Motomu Degai. Their combined efforts contribute to the advancement of semiconductor technologies and innovations.

Conclusion

Ryota Ueno's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods for substrate processing are paving the way for advancements in the industry.