Southfield, MI, United States of America

Ryota Okumura

This inventor holds 1 USPTO granted patent. Top assignees: Cornell University, Denso International America, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryota Okumura. Retrieved from https://idiyas.com/inventor/ryota-okumura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ryota Okumura

Introduction

Ryota Okumura is an accomplished inventor based in Southfield, MI (US). He has made significant contributions to the field of materials science, particularly through his innovative work with graphene.

Latest Patents

Okumura holds a patent for "Graphene and graphene derivatives as substrate coatings." This patent describes a coating layer for a substrate that includes a coating material composed of graphene and/or graphene derivatives. The unique feature of this coating is its ability to reflect and/or absorb electromagnetic (EM) waves with frequencies above 20 GHz. The coating layer is specifically deposited on the surface of the substrate, enhancing its functionality.

Career Highlights

Throughout his career, Okumura has worked with notable organizations, including Denso International America, Inc. and Cornell University. His experience in these institutions has allowed him to develop and refine his expertise in advanced materials.

Collaborations

Okumura has collaborated with talented individuals such as Yong Lak Joo and Naman Gupta, contributing to various projects and research initiatives.

Conclusion

Ryota Okumura's work with graphene and his innovative patent demonstrate his significant impact on materials science. His contributions continue to influence the development of advanced technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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